PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System

Product Details
Customization: Available
Warranty: at Least One Year
Application: Tile Gold Film Vacuum Plating Machine
Manufacturer/Factory, Trading Company
Gold Member Since 2017

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Plant Area
>2000 square meters
Management System Certification
ISO 9001
  • PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
  • PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
  • PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
  • PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
  • PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
  • PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
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Basic Info.

Model NO.
DK
Driven Type
Electric
Voltage
220V, 380V, Customized Definition
Chamber Materials
SUS 304
Service
24h, Remote Guidance
Control System
Automatic, Manual, PLC
Structure Type
Vertical Type
Machine Type
PVD Machine
Accessories
Pumps, Targets, Power Supply Available
Transport Package
Wood Case, Container
Specification
1600*1500mm
Trademark
Danko
Origin
Ningbo, China
HS Code
8479899990
Production Capacity
1000sets/Year

Product Description

PVD, CVD Coating System Machine with MF, RF Magnetron Sputtering System

[PVD] 
Physical Vapor Deposition: Vacuum deposition methods which can be used to deposit thin films and coatings. 


Arc Discharge 
An electric arc or arc discharge is an electrical breakdown of a gas that produces an ongoing electrical discharge. The current through a normally nonconductive medium such as air produces a plasma; the plasma may produce visible light. An arc discharge is characterized by a lower voltage than a glow discharge, and it relies on thermionic emission of electrons from the electrodes supporting the arc. 



Description
Substrate Material: Glass, Metal (carbon steel, stainless steel, brass), Ceramics, Plastic, Jewelry.
Recommend Machine: Multi Arc Ion Coating Machine
Structure Type: Vertical structure, #304 Stainless Steel
A. Coating Film: Multi-functional metal film, composite film, transparent conductive film, reflectance-increasing film, electromagnetic shielding film, decorative film
B. Film Color: multi colors, gun black, titanium golden color, rose golden color, stainless steel color, purple color and other more colors  
C. Film type: TiN, CrN, ZrN, TiCN, TiCrN, TiNC, TiALN and DLC
D. Consumables in production: Titanium, Chromium, Zirconium 


PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System

Process
PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
Application  
Decorative Film
A. Glassware, such as glass cup, glass lamps, glass artworks
B. Table wares, like metal forks and knives.
C. Golf wares, like golf head, golf pole and golf balls.

D. Sanitary Products/bathroom wares
E. Door handles & locks

FWatches parts, like watch case and belt
GMetal jewelry
HLarge size sheet, plate, pipe, tube and so on. Like large stainless steel plate and furnitures.


PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System



Advantages 
A. Fast to film forming, with high deposition speed
B. Film with high Adhesive and high density 
C. Without any gas or liquid wasted
D. Working stably with good vacuum performance
E. Customized processing services


Configurations 
A. Pumps: 
mechanical pump + roots pump + diffusion pump + holding pump (or optional: cryogenic pump, cryogenic pump system)
B. Gas System: 1~4 path
C. Limited Vacuum: 6*10-4 pa (cleanroom, no-loading)
D. Arc Source : 4-18sets (according to different machine size)
E. Power Sources: DC power supply, Medium frequency power supply, medium frequency power supply, heater supply, activation power supply, pulsed bias voltage power supply
F. Targets: DC Magnetic Target, Medium Twin Target, Plane Target
H. Gas Time : 5*10-4 pa, within 30mins
I. Controlled by Manual, Semi-automatic, Full automatic, PLC



PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System


Customer visit 

PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System

Shipment  


PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
 
Workshop 

PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System


PVD, CVD Coating System Machine with Mf, RF Magnetron Sputtering System
For more details on configurations quotations, please contact us.
 

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